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Fat: in the polysilicon production process, the oil molecules and very serious harm to the polysilicon. Actual evidence, the entire process system a few ppm of oil content may result in slower response of polysilicon, lower production, and even silicon reaction stops. Therefore, the polysilicon equipment degreasing process is particularly important.
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Moisture: the water contains large amounts of chloride ion, chloride ion is very sensitive to the reaction of polysilicon. Equipment and systems drying process is critical.
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Chloride residue: water and other solutions in the device surface residual chlorine ions on the polysilicon impact is great. Therefore, after the cleaning process equipment for pure water is very important.
Oxides, dust and other impurities: the existence of other dirt on the production of polysilicon great impact. Thus, in the equipment cleaning process, the use of pickling process to clean the dirt on the other is necessary. Colin technical details visit our website: www.kelinsonic.com |
